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Publication Detail
Optimization of PECVD silicon nitride and silicon oxide gate dielectrics for organic thin-film transistor circuit integration
  • Publication Type:
  • Authors:
    Li FM, Wu Y, Ong BS, Vygranenko Y, Nathan A
  • Publication date:
  • Status:
  • Name of conference:
    MRS Symp. Proc., Organic thin-Film Electronics - Materials, Processes, and Applications
  • Notes:
    Proceedings in press but available on-line
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