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Publication Detail
Temperature dependence of leakage current in segmented a-Si:H n-i-p photodiodes
  • Publication Type:
    Conference
  • Authors:
    Chang JH, Chuang TC, Vygranenko Y, Striakhilev D, Kim KH, Nathan A, Heiler G, Tredwell T
  • Publisher:
    Materials Research Society
  • Publication date:
    2007
  • Place of publication:
    Pittsburgh, US
  • Pagination:
    475, 480
  • Published proceedings:
    Amorphous and polycrystalline thin-film silicon science and technology - 2007: Symposium held April 9-13, 2007, San Francisco, California, U.S.A.
  • Volume:
    989
  • Series:
    Proceedings of the Materials Research Society
  • Editors:
    Chu V,Miyazaki S,Nathan A,Yang J,Zan HW
  • ISBN-13:
    9781558999497
  • Status:
    Published
  • Language:
    English
Abstract
Hydrogenated amorphous silicon (a-Si:H) n-i-p photodiodes may be used as the pixel sensor element in large-area array imagers for medical diagnostics applications. The dark current level is an important parameter that dictates the performances of these types of pixelated imaging devices. Through measurements performed at different ambient temperatures, the leakage current components of segmented a-Si:H n-i-p photodiodes were extracted and analyzed. It was found that the central component of the reverse current depends exponentially on bias and temperature. The activation energy of this component is independent of bias. The peripheral component of reverse current exhibits linear bias dependence at temperatures up to 50°C, while the contribution of this component diminishes at high temperatures. The dependence of dark current components on bias and temperature could be described by compact analytical equations. The model of forward and reverse dark current characteristics in temperature range was implemented in Verilog-A hardware description language.
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