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Publication Detail
Substrate-Dependant Ability of Titanium(IV) Oxide Photocatalytic Thin Films Prepared by Thermal CVD to Generate Hydrogen Gas from a Sacrificial Reaction
  • Publication Type:
    Journal article
  • Publication Sub Type:
    Article
  • Authors:
    Hyett G, Darr JA, Mills A, Parkin IP
  • Publisher:
    WILEY-BLACKWELL
  • Publication date:
    12/2010
  • Pagination:
    301, 304
  • Journal:
    CHEM VAPOR DEPOS
  • Volume:
    16
  • Issue:
    10-12
  • Print ISSN:
    0948-1907
  • Language:
    EN
  • Keywords:
    CHEMICAL-VAPOR-DEPOSITION, SEMICONDUCTOR PHOTOCATALYSIS, WATER-PURIFICATION, COATINGS, TIO2, PHOTOLYSIS, DIOXIDE, ANATASE, GLASS
  • Addresses:
    Hyett, G
    UCL
    Christopher Ingold Lab
    London
    WC1H 0AJ
    England
Abstract
We report the observation of hydrogen production from photodiodes, when irradiated with UV light. These photodiodes were composed of a stainless steel substrate, with a TiO2 photocatalyst deposited suing APCVD on one side and Pt deposited using sputter coating on the other. In contrast similar devices made using a titanium substrate show no measurable H-2 production.
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