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Publication Detail
Recent Trends in Surface Characterization and Chemistry with High-Resolution Scanning Force Methods
  • Publication Type:
    Journal article
  • Publication Sub Type:
    Review
  • Authors:
    Barth C, Foster AS, Henry CR, Shluger AL
  • Publisher:
    WILEY-V C H VERLAG GMBH
  • Publication date:
    25/01/2011
  • Pagination:
    477, 501
  • Journal:
    ADV MATER
  • Volume:
    23
  • Issue:
    4
  • Print ISSN:
    0935-9648
  • Language:
    EN
  • Keywords:
    NONCONTACT ATOMIC-FORCE, TRUE-MOLECULAR RESOLUTION, QUARTZ TUNING FORK, SI QUANTUM DOTS, FREQUENCY-MODULATION-DETECTION, CONTACT POTENTIAL DIFFERENCE, SILICON (111)-(7X7) SURFACE, ELECTRONIC CHARGED STATES, ALKALI-HALIDE SURFACES, TITANIUM-DIOXIDE 110
  • Addresses:
    Barth, C
    Aix Marseille Univ
    CINaM
    CNRS
    F-13288
    Marseille
    09
    France

    Aalto Univ
    Sch Sci & Technol
    Dept Appl Phys
    FI-00076
    Helsinki
    Finland

    UCL
    London Ctr Nanotechnol
    London
    WC1E 6BT
    England

    Tohoku Univ
    WPI Adv Inst Mat Res
    Aoba Ku
    Sendai
    Miyagi
    9808577
    Japan
Abstract
The current status and future prospects of non-contact atomic force microscopy (nc-AFM) and Kelvin probe force microscopy (KPFM) for studying insulating surfaces and thin insulating films in high resolution are discussed. The rapid development of these techniques and their use in combination with other scanning probe microscopy methods over the last few years has made them increasingly relevant for studying, controlling, and functionalizing the surfaces of many key materials. After introducing the instruments and the basic terminology associated with them, state-of-the-art experimental and theoretical studies of insulating surfaces and thin films are discussed, with specific focus on defects, atomic and molecular adsorbates, doping, and metallic nanoclusters. The latest achievements in atomic site-specific force spectroscopy and the identification of defects by crystal doping, work function, and surface charge imaging are reviewed and recent progress being made in high-resolution imaging in air and liquids is detailed. Finally, some of the key challenges for the future development of the considered fields are identified.
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