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Publication Detail
RF probe technology for the next generation of technological plasmas
  • Publication Type:
    Conference
  • Authors:
    Law VJ, Kenyon AJ, Thornhill NF, Seeds AJ, Batty I
  • Publication date:
    01/09/2001
  • Pagination:
    2726, 2733
  • Published proceedings:
    Journal of Physics D: Applied Physics
  • Volume:
    34
  • Issue:
    18
  • Print ISSN:
    0022-3727
  • Keywords:
    GENERATION, plasma, PROBE, technology
  • Notes:
    Imported via OAI, 16:54:26 4th May 2005
Abstract
We describe radio frequency (rf) analysis of technological plasmas at the 13.56 MHz fundamental drive frequency and integer narrow-band harmonics up to n = 9. In particular, we demonstrate the use of harmonic amplitude information as a process end-point diagnostic. Using very high frequency (vhf) techniques, we construct non-invasive ex situ remote-coupled probes: a diplexer, an equal-ratio-arm bridge, and a dual directional coupler used as a single directional device. These probes bolt into the plasma-tool 50 ? transmission-line between the rf generator and matching network, and hence do not require modification of the plasma tool. The 50 ? probe environment produces repeatable measurements of the chamber capacitance and narrow-band harmonic amplitude with an end-point detection sensitivity corresponding to a 2 dB change in the harmonic amplitude with the removal of 1 cm2 of photoresist.The methodology and design of an instrument for the measurement of the plasma-tool frequency response, and the plasma harmonic amplitude and phase response are examined. The instrument allows the monitoring of the plasma phase delay, plasma-tool short- and long-term ageing, and process end-point prediction.
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