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Publication Detail
The development and application of UV excimer lamps in nanofabrication
Abstract
Photon-induced processes hold many unique advantages for thin film processing and surface modification. These include low thermal budgets, lack of ionisation, chemical selectivity, and high cleanliness levels resulting in new chemical pathways to facilitate processing at reduced geometries. For such applications, a variety of sources are available including a wide range of lasers and incoherent lamp systems. In this presentation, the principles and properties of ultraviolet (UV) and vacuum ultraviolet (VUV) radiation generated by decaying excimer complexes will be described. Excimer lamps based on this principle provide highly efficient, high intensity, narrow-band radiation at various distinct wavelengths, with no self adsorption, which can, through insightful variations of the geometric configurations of these dielectric-barrier discharges, make large-scale applications possible. For deep UV applications, sources emitting at wavelengths as low as 126 nm have been developed. The high photon energy levels generated from these sources have been demonstrated to directly photodissociate nitrogen molecules, enabling direct nitridation of surfaces. By surveying a selection of publications in the field, a range of applications of applications for these novel sources in the field of nano-fabrication is discussed. These include the photo-deposition of low- and high-dielectric constant layers, low-temperature oxidation of Si, SiGe and Ge, photo-etching and micro-structuring of polymer surfaces, photo-induced metallization, cleaning of surfaces and UV-curing. From these examples, these relatively low cost lamp systems are demonstrated to be capable of providing low temperature alternatives for large-scale materials processing in a wider range of nano-scale applications. © 2008 Springer Netherlands.
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