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Publication Detail
Antimicrobial activity of copper and copper(i) oxide thin films deposited via aerosol-assisted CVD
  • Publication Type:
    Journal article
  • Publication Sub Type:
    Journal Article
  • Authors:
    Hassan IA, Parkin IP, Nair SP, Carmalt CJ
  • Publication date:
    21/05/2014
  • Pagination:
    2855, 2860
  • Journal:
    Journal of Materials Chemistry B
  • Volume:
    2
  • Issue:
    19
  • Status:
    Published
  • Print ISSN:
    2050-7518
Abstract
Hospital acquired infections are prevalent in many hospitals and contaminated touch surfaces are a route of transmission. To find a solution for this, copper and copper oxide thin films were deposited via aerosol assisted chemical vapour deposition using copper nitrate as the precursor and the films were characterised by a range of techniques including powder X-ray diffraction and scanning electron microscopy. The antimicrobial activity of the deposited copper and copper oxide films were investigated against Staphylococcus aureus (S. aureus) and Escherichia coli (E. coli). A 5-log10 reduction in the viable counts of E. coli was observed on the copper thin films after 30 minutes while a 2-log10 reduction was observed on copper oxide films after 1 hour. In the case of S. aureus both copper and copper oxide films exhibited 4-log10 reduction after 1 hour. The high antimicrobial efficacy of the Cu2O films, approaching that of the pure copper films, suggests that oxide formation on copper objects should not significantly impair their antimicrobial activity. © 2014 the Partner Organisations.
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Dept of Chemistry
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Microbial Diseases
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